Iatrogenic Ventricular Septal Defect After Transcatheter Aortic Valve Implantation: A Rare Complication

Authors

Muhammad Sabri, Thomas Jefferson UniversityFollow
Hussam Al Hennawi, Thomas Jefferson UniversityFollow
Shayan Qadir, Thomas Jefferson UniversityFollow
Lucy Checchio, Jefferson Abington HospitalFollow
Chaitra Janga, Thomas Jefferson UniversityFollow
Hamza Muhammadzai, Thomas Jefferson UniversityFollow
Donald C. Haas, Thomas Jefferson UniversityFollow

Document Type

Report

Publication Date

12-31-2024

Comments

This article is the author’s final published version in Global Cardiology Science and Practice, Volume 2024, Issue 6, Article number 55.

The published version is available at https://doi.org/10.21542/gcsp.2024.55. Copyright © 2024 The Author(s), licensee Magdi Yacoub Institute.

Abstract

Iatrogenic ventricular septal defect (VSD) is a rare complication following transcatheter aortic valve implantation (TAVI). An 83-year-old male underwent TAVI for severe aortic stenosis (AS) and was diagnosed with a peri-membranous VSD on echocardiography, which was not evident on pre-procedural imaging. This case highlights the risk factors, symptoms, diagnosis, and management of iatrogenic VSD following TAVI.

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 License.

Recommended Citation

Sabri, Muhammad; Al Hennawi, Hussam; Qadir, Shayan; Checchio, Lucy; Janga, Chaitra; Muhammadzai, Hamza; and Haas, Donald C., "Iatrogenic Ventricular Septal Defect After Transcatheter Aortic Valve Implantation: A Rare Complication" (2024). Abington Jefferson Health Papers. Paper 134.
https://jdc.jefferson.edu/abingtonfp/134

PubMed ID

40026584